Specifications
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Solaris 150 RTP System (Surface Science Integration)
The Solaris 150 is a manual loading RTP system for R&D and pre-production. The Solaris 150 can process up to 152.4mm substrates at a temperature range from RT- 1300 degrees. The unique temperature measurement system of the Solaris requires virtually no calibration for different wafer types and backside emmissivity differences.
The Solaris uses a unique PID process controller that ensures accurate temperature stability and uniformity. The system can accommodate four interlocked MFCs for gas mixing and forming gas processing. The Solaris is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
Overview
- Excellent repeatability by use of state of the art thermocouple signal conditioning.
- User Friendly software that allows users to interact with data including 9 different graphing options.
- Operating Temperature Range RT - 1300 Degrees Celsius
- Gas Delivery system is capable of up to 6 Mass Flow controllers.
- Zone control temperature for enhanced process control and allows for top side or bottom side heating only as an option.
- Wafer Capability: 1″ to 6″ , Sample holders are available.
- Sic Coated Susceptors available for III-V processing.
Quartz Liners Available for BPSG/PSG Processing
Plasma-Therm 790 Reactive Ion Etcher
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WS-400B-6NPP Spin Coater (Laurell)
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