ATC Orion 5 RF/DC Sputtering System (AJA International)

Features:
-
Main Deposition Chamber: 14.6" high x 12" OD, S/S vacuum chamber.
-
Con-Focal Sputtering: three 2'' magnetron sputter guns with integral isolation chimneys.
-
DC and RF Generators: two 300 Watt RF generators and one 750 Watt DC generator.
-
Quartz Crystal Thickness Monitor.
-
Substrate Holder: accommodates substrates up to 4" diameter; mounts to top of chamber for sputter up orientation; continous motorized rotation (0-40RPM) with controller; radiant heating to 850 C with quartz halogen lamps (+/- 1 degree C temp. stability); capable of being heated in an O2 environment;
-
Gas Handling: mass flow controlled gas line (Ar) - 20 sccm with pneumatic isolation valve(s) and filter.
-
Deposition Uniformity: typically +/- 2.5% thickness uniformity over a 4'' diameter substrates.
-
Base Chamber Vacuum: better than or equal to 3.0×10-8 Torr.
Savannah 100 ALD (UltraTech / Cambridge NanoTech)

Features:
-
Substrate Size: up to 200 mm
-
Substrate Temperature: 25°C - 500°C; ±0.2°C
-
Precursor Sources: Up to 6, heated
-
Deposition Uniformity: <±1%
-
Deposition: High speed/ultra high aspect ratio
-
Control: Labview-USB-PC
UHV PLD System


3118 E-beam evaporator (Varian)
